Shimadzu 30-002 - Laminar-type Replica Diffraction Grating for the Soft X-ray Region

This is a fancy flat-field focusing, holographic grating as opposed to the previously used Rowland gratings.

Product Description

  • Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm). Suitable for the next generation of semiconductor lithography.
  • Less high order light due to laminar type grooves configuration, Low stray light by holographic manufacturing technology, and high resolution from aspherical waves exposure method .
  • Easy to design spectrometers with array-type detectors.
  • Suitable for monitoring EUV lights as well as for Emission Spectroscopy

Specifications

Category Value
Classification Unequally spaced curved-groove laminar-type replica grating *1
Blank material BK-7 or equivalent
Dimension tolerance ±0.2(W)×±0.2(H)
Center thickness tolerance ±0.5(T)
Grooved area Total area less 2mm strip around the perimeter
Effective area Total area less 5mm strip around the perimeter
Groove density tolerance ±0.5%
Coating Gold(Au)
Scratches and digs 80-50(in accordance with MIL-O-13830A)
Temperature 0°C to 50°C

1:The grating grooves are formed with resign.
Be sure to prevent condensation. Otherwise, it causes significant deterioration of optical characteristics

References

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